XPS Investigation of a CdS-Based Photoresistor under Working Conditions: Operando–XPS
نویسندگان
چکیده
منابع مشابه
XPS investigation of a CdS-based photoresistor under working conditions: operando-XPS.
A noncontact chemical and electrical measurement X-ray photoelectron spectroscopy (XPS) technique is performed to investigate a CdS-based photoresistor during its operation. The main objective of the technique is to trace chemical- and location-specified surface potential variations as shifts of the XPS Cd 3d(5/2) peak position without and under photoillumination with four different lasers. The...
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ژورنال
عنوان ژورنال: Analytical Chemistry
سال: 2012
ISSN: 0003-2700,1520-6882
DOI: 10.1021/ac300220u